Advanced lithography


Team Leader: Cécile Gougon


The team of Advanced Lithography has been working, in tight partnership with STMicroelectronics and CEA-Leti, on the improvement of the cutting-edge photolithography techniques used for integrated circuits patterning.


In this challenging domain, requiring tremendous investments that only a few leading industrial groups can afford, it became essential to gather academia and industry R&D efforts. Within this collaborative framework, LTM has been participating to the spectacular progress of conventional photolithography over the last decade by providing developments of simulation tools and nanoimprint techniques.


Currently, our main research topics in these fields are :


Directed Self-Assembly (DSA)

Nanoimprint lithography
Lithography modelling
Metrology by scatterometry
Resist characterization