Advanced lithography

Overview

Team Leader: Cécile Gourgon

 

The team of Advanced Lithography has been working, in tight partnership with STMicroelectronics and CEA-Leti, on the improvement of the cutting-edge lithography techniques used for integrated circuits patterning.

 

In this challenging domain, requiring tremendous investments that only a few leading industrial groups can afford, it became essential to gather academia and industry R&D efforts. Within this collaborative framework, LTM has been involved in the spectacular progress of lithography techniques over the last decade by providing developments of simulation tools and alternative techniques, such as nano-imprint, block copolymers and nanocomposites.

 

Currently, our main research topics in these fields are :

 

Directed Self-Assembly (DSA)

Nanoimprint lithography
Nanocomposites

Metrology