Directed self-assembly of high- x block copolymers for high-resolution lithography in microelectronics

Keywords: lithography, block copolymers self-assembly, plasma etching
Lab description:
The LTM laboratory is a public research laboratory associated to Grenoble Universities and to the National Centre of Scientific Research (CNRS, Department of Engineering and Information Technology). It was founded in 1999 and is hosted within the CEA-LETI -MINATEC campus (10,000 m2 of cleanrooms, 2400 researcher, 1200 students and 600 industrials working on micro and nanotechnologies). Its staff is composed of 30 permanent scientists / lecturers / professors, 18 technicians and engineers, 31 PhDs and 16 post-doctoral members. The main goal of LTM is to contribute to the material and technology developments needed for nanoelectronics and nanotechnology applications.
Block copolymers are one class of polymeric materials consisting of at least two blocks of different types. Depending on the relative affinity of these blocks and their respective molecular weights, it is possible to create periodic patterns of high resolution on the surface of a substrate by natural self-assembly. Control of this self-assembly and its combination with conventional photolithography is a very promising approach for the realization of certain technological steps in microelectronics.
Job description:
The copolymer PS-b-PMMA is already seriously considered for integration in microelectronics and is likely to meet some resolution needs, for example for the dimension reduction of contact holes of the most aggressive contact levels. Nevertheless, for sub-10 nm nodes, other copolymers with higher chemical contrasts (called « high- ») between the two blocs should be used. The lower affinity between the two blocks is not only an advantage for higher resolutions, but also facilitates the removal of one block relative to the other to create the lithography mask. However, this also causes difficulties for the use and self-organization of these thin film materials (preferential wetting of one block to a surface or interface, difficulty in creating neutral surfaces, difficult control of the thermodynamic stability of these materials in thin films and eventually use of non-standard solvent annealing processes to generate self-organization).
LTM and LETI, in close collaboration with the company ARKEMA, are working on the development and integration of new high- block copolymers compatible with a microelectronics industrial environment. The requested work for this position is to participate to this work. In
particular, most promising materials have to be chosen and their integration schemes by “grapho-epitaxy” have to be developed. For this, an important part of the work consists in developing dedicated surface treatments to control microscopic morphologies of self-organized polymers. In the meantime, the development of associated plasma etching processes and the extension of this work up to full 300 mm diameter wafer has to be pursued.
Required / appreciated competences:
 Technological work in a microelectronics environment (lithography, plasma etching, deposition…)
 Polymers
 Surface characterization / Surface chemistry, XPS, DSC, ATG
 Metrology, SEM, TEM, AFM
Collaborations within the project:
ARKEMA, CEA-LETI MINATEC (work in CEA-LETI cleanrooms), LCPO-Bordeaux
Contact :
Laboratoire des Technologies de la Microélectronique (UMR 5129)
Université Grenoble Alpes / CNRS
17 rue des Martyrs
38000 Grenoble, France
Teléphone: 0438789292
Employer: CNRS ; 1 year fixed term contract (available asap, possibility of extension), monthly gross salary: 2300 to 2500 euros depending on experience

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