Research engineer
 
TeamPlasma etching
eMaillaurent.vallier@cea.fr
Phone+33 (0)4 38 78 99 14
AddressLTM
CEA - LETI
17, Avenue des Martyrs
38054 Grenoble Cedex 9
France

VALLIER Laurent

 

VALLIER Laurent

Laurent VALLIER is with the National Centre for Scientific Research (CNRS), France. He received an
Agregation de Sciences Physique in 1981, followed by a Ph.D. degree in plasma physics in 1983 from Paris XI
University. During his Ph.D. thesis performed at the Physique des Milieus Ionises laboratory, Ecole
Polytechnique, Laurent has experienced and developed several plasma diagnostics techniques to probe the
pulsed emission of a Free electron Laser generated by an intense relativistic electron beam in the kA range; at the
same time, the theoretical work developed has helped to better control the electron beam trajectories in the
wiggling magnetic field in order to get a better kinetic to radio frequency power conversion. He then joined
CNRS in 1985 and started a close collaboration with CNET Meylan to develop plasma technologies in Silicon
microelectronic processing, mainly for etching and deposition applications. Working with Olivier Joubert, he
contributed to the development of advanced plasma etching processes with the successful implementation of the
XPS technique on an actual 200mm etching tool. In 1999, Laurent joined the Laboratoire des Technologies de la
Microélectronique (LTM) just founded by the CNRS establishing the frame for close collaborative work with
LETI on the CEA-Grenoble site. He continued to focus on the technology challenges that plasma processing
were facing with the integration of new materials (low k and high k dielectrics, metals…) in IC fabrication at the
nanometre scale, being strongly involved in plasma etching for front end and back end applications. Two
industrial etching platforms were successfully installed and dedicated to R&D in plasma processing. A 200 mm
Si wafer size compatible platform was launched in 2001 followed with a 300 mm platform in 2006. Running
with state of the art plasma process chambers, with the capability to host powerful plasma-surface and gas phase
diagnostics such as mass spectrometry, ellipsometry, broadband or laser UV absorption, quasi in situ X-ray
Photoelectron Spectroscopy, those tools are unique in the world to perform fundamental and applied research in
plasma science and technology. For the past years, as a partner in many projects, either in big integrated
European projects or smaller one at the county scale, funded with government or private industrial money,
Laurent was strongly involved and he has proven the pertinence of this approach to develop and to achieve the
plasma process steps that were needed to make successful challenging tasks in microelectronics and
nanofabrication. The Laurent activity is carried out in close collaboration between the Grenoble University,
CEA-LETI Minatec, equipment supplier and STMicroelectronics. In the framework of a joint development
program with the US company Applied Materials, Laurent recently spent 1 ½ year in Santa Clara (CA) to work
on the development of advanced plasma etch technologies that are needed for the next IC’s fabrication
technologies.


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