Associate professor
TeamPlasma etching
Phone+33 (0)4 38 78 48 12
17, Avenue des Martyrs
38054 Grenoble Cedex 9



Emilie Despiau-Pujo received her M.S. degree in Physics from University Paris XI (Orsay, France) in 2006 and her Ph.D. degree in Plasma Physics from Ecole Polytechnique (Palaiseau, France) in 2009. During her Ph.D. at LPP (CNRS-Ecole Polytechnique), her research interests were plasma etching for photonics applications, dynamics of radiofrequency inductive discharges and fundamentals of plasma-surface interactions. She developed a wide range of plasma simulations (including molecular dynamics, global and 2D fluid/hybrid models) with a particular emphasis on combined experimental/numerical studies. During both her PhD and postdoc, she spent several months working in US research groups, most notably at UC Berkeley (Graves lab in 2006, EECS in 2010). She joined Joseph Fourier University (Grenoble, France) as an associate professor in 2010 and conducts her research in the “Plasma Etching” team at LTM. Most recently her work focuses on the fundamental understanding of new plasma technologies (pulsed plasmas, Low-Te plasmas, gas pulsing) and their potential applications to transfer patterns on ultrathin layered materials (silicon, silicon oxide, graphene).


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